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赛默飞世尔科技(原热电公司）>产品

产品介绍

晶片塑性系统

价格：￥电议

型号：Nicolet ECO/RS

产品完善度：

生产地：其他访问量：784次

发布日期：2009/11/2 0:00:00

更新日期：1900/1/1 0:00:00

详细内容

Nicolet ECO/RS Wafer Profiling System

	The Nicolet^TMECO^TM/RS FT-IR Semiconductor Wafer Profiling System is ideally suited for research and development in semiconductor wafer manufacturing. The ECO/RS 300 is commonly used for measuring dopant concentration levels in dielectric films (BPSG, PSG, FSG, etc.), hydrogen levels in silicon nitride films, epitaxial film thickness, MEMS device thickness, and substitutional Carbon and interstitial oxygen levels in silicon wafers. The ECO/RS 300 can be used with wafers ranging from slugs and pieces to 300 mm in diameter.

Product Detail

	Some of the highlights of the tool include: Based on the powerful Nicolet FT-IR Series spectrometer Easy-to-Use, push-button, software interface Wide variety of powerful quantitative algorithms supporting: ? linear regression ? classical least squares (CLS) ? partial least squares (PLS) Capable of measuring epitaxial film thickness from 300 nm to 7,500 nm On board self diagnostics Powerful FT-IR software toolkit for custom recipe development Extremely reliable Flexible measurement options from single point measurements to complete wafer mapping options Transmission and reflectance measurement capability to accommodate the widest range of materials and films Support of both ASTM and JEIDA standards for measurement of substitutional carbon and interstitial oxygen The ECO/RS 300 maintains the low cost of ownership and high reliability of our long-running series of FT-IR products. Founded on our base of expertise in FT-IR technology, the ECO/RS 300 is also at the top of its class in performance. Thermo is committed to offering the most expertise and the best possible tools for FT-IR metrology. The ECO/RS 300 is another affirmation of this commitment.

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