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真空镀膜二硫化钼Mos2纳米涂层

发布时间:2022/7/25点击次数:125

 性能优势

· Coating deposition carried out using a high density of low energy bombarding ions.

使用高密度低能量轰击离子进行沉积镀膜。

· Deposition of very dense, non-columnar coating structures with low internal stresses.

镀层致密度好,低柱状晶结构,内应力低

· Deposition of coatings with dense structures at low temperatures.

可在低温环境下沉积致密结构的镀层

· High efficiency of ion cleaning resulting in coatings with the highest levels of adhesion.

高效率等离子清理以提供高的镀层结合强度。

· Coatings quality is assured by the use of specially designed Plasmag sputter sources, which create an intense plasma and high ion bombardment of work pieces.

镀层品质保证是由使用门设计plasmag溅射源及提供高密度的等离子。   

 

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